Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• growth of ZnO nanostructures [1]. Keywords: breath figure; nanopatterned template; polymer blend lithography (PBL); self-assembled monolayer (SAM); self assembly; spin coating; vapor phase; Introduction Self-assembled monolayers (SAMs) are well-known and have been intensively studied for many years

• can be directly used as a lithographic mask. This lithographic mask, in turn, can be removed by snow-jet lift-off after deposition of a silane monolayer (SAM) on the unprotected areas in the vapor phase. For the examples demonstrated, the fabricated nanopatterned template shows a chemical contrast